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Master Extreme Ultraviolet Lithography Techniques
Produce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and minimize wasted energy. You will also learn how to use Mo/Si deposition technology, fine-tune performance, and optimize cost of ownership.
Design EUVL-ready photomasks, resist layers, and source-collector modules
Assemble optical components, mirrors, microsteppers, and scanners
Harness laser-produced and discharge pulse plasma sources
Enhance resolution using proximity correction and phase-shift
Generate modified illumination using holographic elements
Measure critical dimensions using metrology and scatterometry
Deploy stable Mo/Si coatings and high-sensitivity multilayers
Handle mask defects, layer imperfections, and thermal instabilities
Table of contents
Preface Chapter 1. Wigner Distribution in Optics Chapter 2. Ambiguity Function in Optical Engineering Chapter 3. Rotations in Phase Space Chapter 4. The Radon-Wigner Transform in Analysis, Design, and Processing of Optical Signals Chapter 5. Imaging Systems: Phase-Space Representations Chapter 6. Super Resolved Imaging in Wigner-Based Phase Space Chapter 7. Radiometry, Wave Optics, and Spatial Coherence Chapter 8. Rays and Waves Chapter 9. Self-Imaging in Phase Space Chapter 10. Sampling and Phase Space Chapter 11. Phase Space in Ultrafast Optics Index
Banqiu Wu, Ph.D., is Chief Technology Officer, Mask Products Division, Applied Materials, Inc.
Ajay Kumar, Ph.D., is General Manager, Cleans and Mask Products Business Group, Applied Materials, Inc.